Thin films of transition metals and their oxides are crucial ingredients in advanced material applications such as magnetic information storage, microelectronics, and catalysis. ALD (Atomic Layer Deposition) and CVD (Chemical Vapour Deposition) are two chemical deposition techniques used to deliver uniform thin films for these applications. Iron amidinates can be used in these techniques to deliver iron, iron carbides and iron nitride films.
Strem Chemicals UK s now offers the iron bis(N,N’-di-tert-butylacetamidinate) (26-0145) CAS 635680-56-7 , an oxygen-free and Fe-C bond-free potential candidate, for use in growing oxygen-free and carbon-free iron thin films utilizing both ALD2 and MOCVD3 techniques. The high thermal stability, volatility (sublimes at 55oC and 60 mTorr)2, and selective reactivity with molecular hydrogen affords fine films of metal or metal oxides. Other components can be Fe3C, and Fe4C or Fe4N depending on the precursor and the temperature.
Products mentioned in this blog and related products:
26-0145: Bis(N,N’-di-t-butylacetamidinato)iron (II), min. 98%, CAS #635680-56-7
26-0850: Cyclohexadiene iron tricarbonyl, 98%, CAS #12152-72-6
26-0875: Cyclooctatetraene iron tricarbonyl, 98%, CAS #12093-05-9
26-2800: Iron pentacarbonyl, 99.5% (99.9+%-Fe), CAS #13463-40-6
93-2644: Iron(III) trifluoroacetylacetonate, 99% (99.9%-Fe), CAS # 14526-22-8
26-3910: Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)iron(III), 99% (99.9%-Fe) [Fe(TMHD)3], CAS # 14876-47-2