MOCVD, CVD and ALD Precursors for use in Micro & Nano electronics

MOCVD, CVD and ALD Precursors for use in Micro & Nano electronics

Nano layers of metals, semiconducting and dielectric materials are crucial components of modern electronic devices, high-efficiency solar panels, memory systems, computer chips and a broad variety of high-performance tools. We provide high-quality purified precursors for research in semiconductor and thin film research and development, as ALD. Atomic Layer Deposition, CVD Chemical Vapour Deposition, and MOCVD, Metal Oxide Chemical Vapour Deposition is a technique for depositing thin layers of atoms onto a semiconductor wafer Using MOCVD you can build up many layers, each of a precisely controlled thickness, to create a material which has specific optical and electrical properties.
The technique of choice for depositing nano-films on various surfaces is Atomic Layer Deposition (ALD), which uses consecutive chemical reactions on a material’s surface to create nanostructures with predetermined thickness and chemical composition
Strem Chemicals 50 years of experience in the manufacture of inorganic and organometallic chemicals has allowed us to expand our products. We are continually adding new products for this dynamic and exciting field.
We can also offer high-quality precursors for ALD safely packaged in steel cylinders suitable for use with a variety of deposition systems.