Tag: Chemical Vapour deposition

High quality LaLuO3, ALD grown from Lanthanum and Lutetium amidinates, is an ideal gate dielectric to replace SiO2 in MOSFETs

Lanthanum and lutetium amidinate precursors are used to grow desirable high-k ternary oxides by atomic layer deposition Silicon-based metal oxide…

Anyone can find the dirt in someone. Be the one that finds the gold in our precursors!

Recently released is our volatile, air, light and & thermally stable precursor for CVD/ALD of gold thin films

Strem Chemicals Catalogue is available as a New Digital Version!

  Due our large increases in the amount of chemicals and materials and in the spirit of our growing digital…

New bubbler for ALD and CVD

By popular demand we have continued to expand our selection of electro polished stainless steel bubblers to meet your metal…

CVD , Monolayer Graphene on Copper Substrate

Copper Foil with CVD Coated Graphene Monolayer for Electronic Studies Monolayer graphene plays an important role in graphene technologies. Exfoliating…